Stanford University US-Japan Technology Management Center

Spring 2006 SEMINAR SERIES
Topics in International Advanced Technology Research

Spring 2006 Theme

Novel Materials and Devices for Nano- Electronics

 

 

 

Yoshio Nishi

Professor, Department of Electrical Engineering

Stanford University



Yoshio Nishi is a Professor in Department of Electrical Engineering (research) and also in Department of Material Science and Engineering at Stanford University since May 2002. He also serves as Director of Stanford Nanofabrication Facility of National Nanotechnology Infrastructure Network of US, and Director of Research of Center for Integrated Systems.
Professor Nishi Received BS in material science and PhD in electronics engineering from Waseda University and the University of Tokyo, respectively.


He joined Toshiba R&D in the areas of research for semiconductor device physics and interfaces mostly in silicon, resulting in discovery of ESR PB Center at SiO2-Si interface, the first 256bitMNOS non-volatile RAM, SOS 16bit micro-processor and the world 1st 1Mb CMOS DRAM. He moved to Hewlett-Packard in1986 as the Director of Silicon Process Lab, followed by establishing ULSI Research Lab as the Founding Director. In 1995 he joined Texas Instruments, Inc as Senior VP and Director of Research and Development for semiconductor group, and implemented new R&D model for silicon technology development, followed by establishing Kilby Center.


Since May 2002, he became a faculty member of Stanford University, and his research interest covers nanoelectronics devices and materials including metal gate/high K MOS, device layer transfer for 3D integration, nanowire devices and non-volatile memory materials and devices. After joining Stanford, he still served Texas Instruments as a newly created position of Chief Scientist until the end of 2004 on a part time base. He published more than 200 papers including conference proceedings, and co-authored and edited 8 books. He holds more than 70 patents in US and Japan. During the period of 1995-2002 he served SRC and International Sematech as Board member, NNI Panel, MARCO Governing Council. etc. Dr. Nishi is the Fellow of IEEE, a member of Japan Society of Applied Physics and the Electrochemical Society. Recent awards which he received include 1995 IEEE Jack Morton Award, and 2002 IEEE Robert Noyce Medal.

 

Spring 2006 Seminars

 

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